New Electronics

electronEUV lithography is now considered by experts as one of the most promising methods in the future manufacture of integrated circuits. This technology has no restrictions in terms of miniaturization, which distinguishes it from the optical lithography, which is now nearing its limit of applicability.

In the case of EUV lithography method is used “squeezing” a certain relief on the substrate, followed by the formation of the necessary structures for the functioning of the chip. This method was originally developed as an option for further miniaturization of integrated circuits, when other methods have exhausted themselves.